Developments in Surface Contamination and Cleaning: Cleaning Techniques by... 9780323299619

eBay item number:

301799193987

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Item specifics

Condition:

New: A new, unread, unused book in perfect condition with no missing or damaged pages. See the seller's listing for full details. See all condition definitions– opens in a new window or tab ... Read moreabout the condition

Subject:

Engineering & Technology

Format:

Hardback

Subject 2:

Electronics Engineering & Communications Engineering

Language:

English

Publication Year:

18/11/2014

ISBN:

9780323299619

EAN:

9780323299619

About this product

Product Identifiers
Publisher	William Andrew Publishing
ISBN-10	032329961x
ISBN-13	9780323299619
eBay Product ID (ePID)	209638472

Product Key Features
Format	Hardback

Dimensions
Weight	480g
Width	152mm
Height	229mm

Additional Product Features
Place of Publication	Norwich
Genre	Electronics Engineering & Communications Engineering
Pagination	234
Author Biography	NASA Johnson Space Center -Rajiv Kohli is a leading expert in contaminant particle behaviour, surface cleaning and contamination control. At the NASA Johnson Space Center he has primary responsibility for contamination control related to spaceflight hardware for the Space Shuttle, the International Space Station, and the new Constellation Program (designed to meet the United States Vision for Space Exploration). He helped to develop solvent-based cleaning applications for the nuclear industry and an innovative microabrasive system for a wide variety of applications in the commercial sector. He co-authored Commercial Utilization of Space: An International Comparison of Framework Conditions, and has published over 200 technical papers. His other specialisms include precision cleaning, solution and surface chemistry, advance materials and chemical thermodynamics. In 2005, Dr. Kohli received the Public Service Medal, one of NASA's highest awards, for contributions to the Space Shuttle Return to Flight project. Editor: 'Reviews of Adhesion and Adhesives' was associated with IBM from 1972 to 1994. Currently, he is teaching and consulting in the areas of adhesion science and technology and in surface contamination and cleaning. He is the founding editor of the Journal of Adhesion Science and Technology and is editor of 85 books, many of them dealing with surface contamination and cleaning. In 2002, the Kash Mittal Award was inaugurated for his extensive efforts and significant contributions to the field of colloid and interface chemistry. Among his numerous awards, Dr. Mittal was awarded the title honoris causa by the Maria Curie-Sklodowska University in Lubin, Poland in 2003.
Country of Publication	United States
Subject	Engineering & Technology
Table of Contents	1 Cleaning for Removal of Post Chemical Mechanical Planarization Residue (Manish Keswani)2 Liquid Displacement Drying Techniques (Ian Parry)3 UV Ozone Cleaning (Rajiv Kohli)4 Carbon Dioxide Dry Ice Spray Cleaning (Simon Motschmann)5 Use of Water Ice Pellets for Removal of Surface Contaminants (Rajiv Kohli)6 Advanced Cleaning Processes in Semiconductor Manufacturing (Mahmood Toofan)7 Precision Cleaning of Electronic Assemblies (Helmut Schweigert)
Imprint	William Andrew Publishing
Language(s)	English
Date of Publication	18/11/2014
Edited by	Kashmiri L. Mittal, Rajiv Kohli

Item description

Developments in Surface Contamination and Cleaning Cleaning Techniques by Rajiv Kohli 9780323299619 (Hardback, 2014)

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Bertram Trading Limited

Robert Moss

1 Broadland Business Park

Norwich

Norfolk

NR7 0WF

United Kingdom

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VAT number:

DE 298528121

GB 290597369

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Item location: Norwich, United Kingdom

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