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30 Illustrations, color; 5 Illustrations, black and white; VIII, 40 p. 35 illus., 30 illus. in color. With online files/update.
Table Of Contents
Introduction.- Background.- On-wafer monitoring technique.- On-wafer UV sensor and prediction of UV irradiation damage.- Introduction.- Prediction system for UV spectrum.- Prediction system for UV-radiation damage in dielectric films.- Prediction of Abnormal Etching Profile in High-Aspect-Ratio Via/Hole Etching Using On-Wafer Monitoring System.- Introduction.- Ion-trajectory prediction.- Twisting prediction.- Feature Profile Evolution in Plasma Processing using Wireless On-wafer Monitoring System.- Introduction.- Experimental Results and Discussion.- Conclusions.
Prof. Seiji Samukawa Distinguished Professor in Tohoku University Professor in Institute of Fluid Science, Professor and Principal Investigator, WPI-AIMR in Tohoku University.