Chip density and performance have been driven by scaling of semiconductor devices. This book tells how SiO2 gate dielectrics have reached its minimum thickness due to direct tunneling current and reliability concerns. Therefore, high-k dielectrics attracted more attention from industries as the replacement of conventional SiO2 gate dielectrics.
Jack C. Lee, Young Hee Kim
Morgan & Claypool Publishers
Date of Publication
Energy Technology & Electrical Engineering
Synthesis Lectures on Solid State Materials and Devices