Glow Discharge Processes: Sputtering and Plasma Etching by Brian Chapman: Used

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US $187.42
Approximately£140.71
Condition:
Good
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Located in: Sparks, Nevada, United States
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eBay item number:403985121402
Last updated on 13 Aug, 2025 01:47:39 BSTView all revisionsView all revisions

Item specifics

Condition
Good: A book that has been read, but is in good condition. Minimal damage to the book cover eg. ...
Book Title
Glow Discharge Processes: Sputtering and Plasma Etching
Publication Date
1980-09-25
Pages
432
ISBN
9780471078289
Category

About this product

Product Identifiers

Publisher
Wiley & Sons, Incorporated, John
ISBN-10
047107828X
ISBN-13
9780471078289
eBay Product ID (ePID)
6038279070

Product Key Features

Number of Pages
432 Pages
Publication Name
Glow Discharge Processes : Sputtering and Plasma Etching
Language
English
Publication Year
1980
Subject
Physics / Electromagnetism, Aeronautics & Astronautics
Type
Textbook
Author
Brian Chapman
Subject Area
Technology & Engineering, Science
Format
Hardcover

Dimensions

Item Height
1.3 in
Item Weight
30 Oz
Item Length
9.5 in
Item Width
6.4 in

Additional Product Features

Edition Number
1
Intended Audience
Scholarly & Professional
LCCN
80-017047
Dewey Edition
19
Illustrated
Yes
Dewey Decimal
537.5/2
Table Of Content
Gases. Gas Phase Collision Processes. Plasmas. DC Glow Discharges. RF Discharges. Sputtering. Plasma Etching. Appendices. Index.
Synopsis
Develops detailed understanding of the deposition and etching of materials by sputtering discharge, and of etching of materials by chemically active discharge. Treats glow discharge at several levels from basic phenomena to industrial applications--practical techniques diligently related to fundamentals., Develops detailed understanding of the deposition and etching of materials by sputtering discharge, and of etching of materials by chemically active discharge. Treats glow discharge at several levels from basic phenomena to industrial applications--practical techniques diligently related to fundamentals. Subjects range from voltage, distributions encountered in plasma etching systems to plasma-electron interactions that contribute to sustaining the discharge.
LC Classification Number
QC711.8.G5

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