Manufacturable Process Tool for High Metal Gate 9783836481564 Book

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Format: Paperback / softback. Paperback / softback. Off state leakage current related power dominates the CMOS heat dissipation problem of state of the art silicon integrated circuits. A system for monolayer photoassisted deposition was modified to deposit high-quality HfO2 films with in-situ clean, in-situ oxide film deposition, and in-situ anneal capability.
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